Producing high-purity wafers via the CMP process is a critical application and the halting of harmful slurry-DIW ...

Japanese conglomerate Fujifilm has opened a new facility for the production of Chemical Mechanical Polishing (CMP) slurries, a basic material used in semiconductor manufacturing process. CMP slurries ...

The semiconductor manufacturing industry continues to progress rapidly, with standards, materials and requirements evolving annually. Industry leaders leverage novel solutions to overcome their ...

The electronic chemical start-up ChEmpower has raised $18.7 million in a series A funding round to advance its abrasive-free system for polishing and planarizing silicon wafers during semiconductor ...

The semiconductor manufacturing process involves many steps, including, but not limited to, film deposition, photolithography, etching, and chemical mechanical polishing (CMP). Contamination can ...

INITIAL PRODUCTS TO BE SOLD INCLUDE CHEMICAL MECHANICAL PLANARIZATION (CMP) SOLUTIONS FOR SILICON CARBIDE (SiC) APPLICATIONS BILLERICA, Mass.--(BUSINESS WIRE)-- Entegris, Inc. (Nasdaq: ENTG), a ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...